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Уведомление об обновлениях схем

Change Notification #   4882
Revision  
Type of Notification   PRODUCT/PROCESS CHANGE NOTIFICATION
Change Title   LCX Process Flow Change
Issue Date   1999-07-26
Affected Product Family   DISCRETES AND LOGIC
Description   LCX Logic wafers being fabricated at Charter Semiconductor in Singapore, will have the Epitaxial Layer and a Vthreshold adjust Step removed in the present process flow. The circuit design, layout and dimensions are not altered in this change. The EPI layer is used for Latchup prevention and Vth adjust was used for leakage containment in the OVT circuitry. These steps were originally carried over from an earlier process flow in MOS6 fab, and are considered not necessary on CSM design rules. The removal of these 2 steps have been electrically evaluated on another family and shown not to alter the characteristics of the device.
Key Items Affected by Change   Subcontractor Fab Site Wafer Process
 
Key Milestones  
Effective Date:   1999-11-04
Sample Info:   Contact your local Motorola Sales Office
Possible Replacements   N/A

For more information on this Process Change Notification, please contact your local ON Semiconductor sales office.

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